Nonvolatile memory system, semiconductor memory, and writing method

ABSTRACT

A nonvolatile semiconductor memory recovers variation in the threshold of a memory cell due to disturbance related to a word line. The nonvolatile memory continuously performs many writing operations without carrying out single-sector erasing after each writing operation, performing the additional writing operations quicker than the usual writing operation, and lightening the burden imposed on software for use in additional writing. The data stored in a designated sector is read out before being saved in a register, and the selected sector is subjected to single-sector erasing when a predetermined command is given. Then write expected value data is formed from the saved data and data to be additionally written, completing the writing operation.

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to information writing for anonvolatile semiconductor memory, and more particularly to a nonvolatilememory system with improved single-sector erasing.

[0003] 2. Description of the Related Art

[0004] A flash memory, which is a kind of EEPROM (Electrically ErasableProgrammable Read Only Memory), employs nonvolatile memory elements,such as MOSFETS, (metal-oxide semiconductor field-effect transistors),each having a control gate and a floating gate. The flash memory storesinformation in individual memory cells, each constituted by a MOSFETaccording to the transistor threshold voltage. In such a flash memory,the threshold voltage is set low (logic “0”) during the writingoperation by putting the drain voltage of the nonvolatile memory elementat, for example, 5 V, and by putting the word line connected to thecontrol gate CG at, for example, −10 V as shown in FIG. 18, so as todraw electrical charge from the floating gate FG into the drain region.During an erasing operation, the threshold is set high (logic “1”) byputting the well region at −5 V, for example, and the control gate CG ata voltage as high as 10 V (logic “1”) so as to inject negative chargeinto the floating gate FG as shown in FIG. 19. Thus, one-bit data isstored in one memory cell.

SUMMARY OF THE INVENTION

[0005] In a typical conventional flash memory, control gates of aplurality of memory cells are connected to one word line. With theplurality of memory cells connected to the word line as a basic unit(hereinafter called a ‘sector’), erasing, writing, and readingoperations are performed in respective operating modes. For example, theerasing operation is simultaneously performed in a plurality of memorycells having a common word line, on a sector basis, and a specificmemory cell is not selectively erasable.

[0006] On the other hand, the conventional writing operation isperformed by raising the threshold as shown in FIG. 20(a) after thesector erasing operation has been performed once, applying −10 V to theword line connected to the memory cell whose threshold is to be lowered,and applying 5 V to the drain. As a result, the threshold of the writtenmemory cell becomes lower than the verify voltage Vpv as shown in FIG.20(b).

[0007] Although 0 V is applied to the drains of memory cells that arenot written, that is, those whose thresholds are not intended to belowered, a voltage as great as −10 V is applied to the gates of theother memory cells sharing the word line with the written cell.Consequently, there occurs a phenomenon, called a “disturbance”, inwhich the threshold is slightly lowered for all of the memory cellsconnected to the word line. Even memory cells that are not to be writtenare subjected to a slight threshold voltage change (in this instance,voltage drop), though only the threshold of a specific memory cell to bewritten is desired to be varied. This disturbance is called a“disturbance related to a word line”, or “word disturbance”, since itoccurs when voltage is applied mainly to the word line.

[0008] Due to the word disturbance, the writing operation requires priorsingle-sector erasing, as shown with reference to FIGS. 20(a)-20(f).When the plurality of memory cells connected to a common word line aresubjected to single-sector erasing initially, the thresholds of theplurality of memory cells are all put in the erased state (FIG. 20(a)).Then, the writing operation is performed so as to put the threshold of aspecific memory cell selectively in the written state (FIG. 20(b)). Atthis time, the plurality of memory cells substantially consist of afirst memory cell group whose threshold voltage is in the erased state(shown by a dotted line of FIG. 20(c)) and a second memory cell groupwhose threshold voltage is in the written state (shown by a dotted lineof FIG. 20(d)).

[0009] Since the memory cells cannot be erased selectively, only thefirst memory cell group remains writable. Therefore, any one of thecells in the first memory cell group can be selected and written. Then,when the word disturbance occurs, the threshold voltage of thenot-written memory cells is lowered, as shown by a solid line in FIGS.20(c)-20(d).

[0010] If no single-sector erasing is performed, the multiple repetitionof disturbance resulting from repeated writing operations lowers thethreshold of the memory cell below a word line reading voltage level Vrat the time of reading data, as shown in FIG. 20(e), and causes errordata to be read out. Further, the threshold of the memory cell becomeslower than the ground potential Vss, whereby the memory cell is turnedON even though not selected, as shown in FIG. 20(f). When a memory cellconnected to a different word line but to a common source line isselected, the charge on the data line flows into the source through thememory cell whose threshold is lower than the aforementioned groundpotential Vss, with the result again that error data may be read out.

[0011] A system of increasing the threshold of a memory cell through thewriting operation is also known, by making the low threshold state anerased state depending on the memory array configuration. However, adisturbance phenomenon still exists in such a writing system because thethreshold of a non-written memory cell having a common word line at thetime of writing becomes slightly higher (see FIGS. 21(c), 21(d)). Whendisturbance is repeated several times, the threshold of the memory cellbecomes higher than the word line reading level Vr at the time ofreading data as shown in FIG. 21(e). Again, error data may be read out.

[0012] FIGS. 22(a)-22(f) show an information map of sectors controlledby one word line. As shown in FIGS. 22(a)-22(c), a 512-byte (4096-bit)memory cell is connected to one word line. The effective utilization ofthe memory can be planned by providing within the same sector a mixtureof a storage area (hereinafter called the “system area”), which isusually not written by general users, for storing OS (operating system)information, sector control information and the like, and a storage area(hereinafter called the “user area”) to which users are allowed to writeinformation freely. The number of bits in the system area is far smallerthan the number of bits in the user area.

[0013] In the flash memory of such a storage system, predetermined datais written to the system area, whereas the unwritten user area isoffered to the user. It would be convenient to be able to selectivelywrite to the memory cells in the large user area so as to permitrepeated “additional” writing operations, without affecting thealready-written system area, and without first erasing the system area.In other words, it would be convenient for the user to be able to writeto the unwritten user area without requiring an intermediate sectorerase. However, such additional writing operations have not beenpossible because of disturbance, which prevents the reliability ofinformation stored in the conventional flash memory from being assured.

[0014] Even though such additional writing has been conceivable, therehas been a substantial limit on the number of additional writingoperations to be repeated continuously in consideration of the thresholdvariation due to the disturbance. By way of example, as few as twoconsecutive writing operations have compromised the integrity of storeddata in the prior art, due to disturbance.

[0015] Furthermore, the memory itself has not been designed for use inthe manner mentioned above. For this reason, if additional writing iscarried out in the conventional flash memory, the time required for theadditional writing is extremely long, a burden too heavy for the systemsoftware because of the necessity to synthesize the read data and theadditional write data, and to write the data combination after readingout the data in the sector involved and then subjecting the sector tosingle-sector erasing as discussed above.

[0016] An object of the present invention is to provide a nonvolatilesemiconductor memory that is capable of recovering a variation in thethreshold of a memory cell due to disturbance related to a word line.

[0017] Another object of the present invention is to provide anonvolatile semiconductor memory that is capable of continuouslyperforming an additional writing operation without carrying out asingle-sector erase for each write.

[0018] Still another object of the present invention is to provide anonvolatile semiconductor memory that is capable of performing anadditional writing operation at a speed higher than that which isrequired for the usual writing operation, lightening the burden imposedon software for use in additional writing.

[0019] A brief description will be given of the substance of theinvention disclosed in the present specification.

[0020] The data stored in a sector at a designated address is read outbefore being saved in a register, and the sector involved is subjectedto single-sector erasing when a predetermined instruction (command) isgiven. Actual write data (hereinafter called the “write expected valuedata”) is formed from the saved data and data to be additionallywritten, so that a writing operation is performed.

[0021] The flash memory system comprises a plurality of memory cells forstoring information in conformity with first and second thresholdvoltage states. The memory cells are arranged in a functional memoryarray having a word line connected to control gates of the plurality ofmemory cells, and a sequencer which has a command input terminal forcontrolling erase and write operations on information stored or to bestored in the plurality of memory cells in accordance with aninstruction which is input to the command input terminal. Theinstruction that the sequencer receives may be an erase command forcollectively putting the plurality of memory cells in the first (erased)state, or an “additional write command” for selectively changing atleast one of the memory cells from the first state to the second state,the additional write command being used for executing not the erasecommand, but a write operation performed continuously (i.e., a pluralityof times without an intervening sector erase).

[0022] In a more preferable embodiment of the invention, some of theplurality of memory cells whose threshold voltage is in the first stateconstitute a first memory group, and the rest constitute a second memorygroup. According to the additional write command, then, the followingsteps are taken: The threshold voltage of the memory cells in the secondmemory cell group is placed between the first state and the secondstate, and subsequently at least one memory cell selected from those inthe first memory cell group is put in the second state, along with thosein the second memory cell group.

[0023] According to a further preferable embodiment of the invention,the instruction that the sequencer receives includes an erase commandfor causing a first voltage to be applied to the word line tocollectively put the threshold voltage of the plurality of memory cellsin the first state. Then, a first write command causes a second voltageto be applied to the word line to put the threshold voltage of memorycells in the selected first memory cell group in the second state, and asecond write command causes the first voltage to be applied so as tochange the threshold voltage of the plurality of memory cells from thesecond state to the first state. The second voltage is then applied tothe word line to put the threshold voltage of memory cells in theselected second memory cell group in the second state.

[0024] Thus, the variation in the threshold voltage of the memory cellsdue to the word disturbance at the time of the additional writing isrecovered, and error data is prevented from being read. Consequently, itis possible to increase greatly the number of times that additionalwriting is continuously carried out without executing an erasinginstruction. By way of example, the present invention is capable ofperforming 15 consecutive write operations without an intervening sectorerase.

[0025] By using additional write data fed from the outside and the dataread from the selected sector and held in the internal register, thewrite expected value data is arranged to be automatically formed inside,and then the writing operation is performed. With this arrangement, theadditional writing operation can be performed at a speed higher than theordinary writing, and the burden imposed on software at the time ofadditional writing is lightened.

[0026] These and other objects, advantages, and novel features of thepresent invention will become apparent from the following detaileddescription when read in connection with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

[0027]FIG. 1 is a schematic overall block diagram illustrating a flashmemory embodying the present invention.

[0028]FIG. 2 is a circuit diagram showing an exemplary arrangement of amemory array of a flash memory according to the present invention.

[0029]FIG. 3 is a circuit diagram showing specific examples of a senselatch circuit SLT and a data inverting circuit WRW.

[0030]FIG. 4 is a flowchart showing an additional writing procedure fora flash memory according to an embodiment of the invention.

[0031]FIG. 5 is a timing chart showing signal timing in the memory arrayat the time of additional writing (first half) in a flash memoryaccording to an embodiment of the invention.

[0032] FIGS. 6(a)-6(c) are waveform charts showing sense latching at thetime of additional writing (first half) and a data line leveldisplacement in a flash memory according to an embodiment of theinvention.

[0033]FIG. 7 is a timing chart showing signal timing in the memory arrayat the time of additional writing (second half) in a flash memoryaccording to an embodiment of an invention.

[0034] FIGS. 8(a)-8(b) are waveform charts showing sense latching at thetime of additional writing (second half) and a data line leveldisplacement in a flash memory according to an embodiment of theinvention.

[0035] FIGS. 9(a)-9(c) explain the variation in the threshold of amemory cell at the time of additional writing in a flash memoryaccording to an embodiment of the invention.

[0036] FIGS. 10(a)-10(f) explain the variation in the threshold of amemory cell in a flash memory according to an embodiment of theinvention.

[0037]FIG. 11 is a circuit diagram showing another memory array of aflash memory according to the present invention.

[0038] FIGS. 12(a)-12(f) explain the variation in the threshold of amemory cell in the flash memory of FIG. 11.

[0039]FIG. 13 is a flowchart showing a first-stage read commandexecuting procedure for explaining a second flash memory embodying thepresent invention.

[0040]FIG. 14 is a flowchart showing a second-stage erase commandexecuting procedure for explaining a second flash memory embodying thepresent invention.

[0041]FIG. 15 is a flowchart showing a third-stage write commandexecuting procedure for explaining a second flash memory embodying thepresent invention.

[0042]FIG. 16 is a schematic overall block diagram illustrating a thirdflash memory embodying the present invention.

[0043]FIG. 17 is a schematic block diagram of a memory card as anexample of an application of the flash memory according to the presentinvention.

[0044]FIG. 18 is a sectional view showing an example of applied voltageat the time of writing a memory cell in a flash memory.

[0045]FIG. 19 is a sectional view showing an example of applied voltageat the time of erasing a memory cell in a flash memory.

[0046] FIGS. 20(a)-20(f) show the variation in the threshold of thememory cell in a conventional flash memory.

[0047] FIGS. 21(a)-21(e) show the variation in the threshold of thememory cell in another conventional flash memory.

[0048] FIGS. 22(a)-22(f) collectively show an exemplary arrangement ofan additionally writable sector in a flash memory.

[0049] FIGS. 23(a)-23(f) explain the variation in the threshold of amemory cell in a flash memory according to an embodiment of theinvention.

[0050] FIGS. 24(a)-24(f) explain the variation in the threshold of amemory cell in the flash memory of FIG. 11.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0051] A description will subsequently be given of the present inventionapplied to a flash memory and embodiments thereof by reference to theaccompanying drawings.

[0052] <Embodiment 1>

[0053]FIG. 1 shows a flash memory embodying the present invention. Eachof the circuit blocks in FIG. 1 is shown formed on one semiconductorchip 1 of single-crystal silicon, although the invention is not solimited.

[0054] In FIG. 1, a memory array 11 is constituted by a plurality ofindividual transistor cells arranged in a matrix, each of which has afloating gate as shown in FIG. 18. A data register 12 holds data of onesector read from the memory array 11 and write data fed from theoutside, and a rewrite circuit 13 is provided between the memory array11 and the data register 12.

[0055] An address register 14 holds an address signal fed from theoutside, an X-decoder 15 selects one word line out of the word lineswithin the memory array 11 and which corresponds to the address receivedby the address register 14, and a Y-address counter 16 sequentiallytransfers the write data received from the outside to the data register12 and generates a Y-address signal (data-line selecting signal) foroutputting the data that has been read into the data register 12outside. The Y-address counter 16 has the function of sequentiallyupdating the leading address of one sector up to its final address andoutputting the updated result, in conjunction with a Y-decoder 17 thatdecodes the Y-address generated so as to select one data within the onesector, and a main amplifier 18 for amplifying the data read into thedata register 12 and outputting the amplified data.

[0056] The flash memory according to the present embodiment of theinvention has a data input/output interface that can be seriallyaccessible, although the flash memory is not so limited. At the time ofreading, for example, one word line is selected when the address of asector to be read is input, and data are read in parallel from theplurality of memory cells connected to the word line and then held in asense latch SLT group once, which will be described later. The senselatch group is contained in the data register 12 and successivelyselected by the Y-address counter, the data held therein being seriallyoutput. At the time of writing, serial data are input and written to theselected sector via a reverse path. Further, a plurality of input/outputterminals are provided for the memory chip, via which data equivalent toone sector are divided and serially input/output.

[0057] Although not limited thereto, the flash memory according to thisembodiment of the invention further comprises a command register &decoder 21 for holding commands supplied from an external CPU and thelike and decoding the commands, and a control circuit (sequencer) 22 forsequentially forming control signals intended for respective circuits inthe memory so as to perform a process corresponding to the command onthe basis of the result decoded by the command register & decoder 21.When a command is given, the flash memory is adapted to decode thecommand and automatically start performing a corresponding process.

[0058] Like the control unit of a CPU of a microprogram system, forexample, the control circuit 22 has a ROM (Read Only Memory) in which isstored a series of microinstructions for executing commands. When thecommand register & decoder 21 generates the leading address of themicroinstructions corresponding to the command and provides the controlcircuit 22 with the leading address, a microprogram can be arranged sothat it is started then. Software installed in the ROM is stored with aninstruction procedure which will be described with reference to FIG. 4,and conditions including the duration of voltage application and thelike. The ROM may be loaded with only a minimum of microinstructions,whereas a rewritable flash memory may be stored with instructionconditions and additional programs.

[0059] Further, the flash memory according to this embodiment of theinvention is provided with, in addition to the aforementioned circuits,an I/O buffer 23 for inputting/outputting an address and a data signal,a control signal buffer 24 for receiving the control signal suppliedfrom the external CPU and the like, and an internal power supply circuit25 for generating voltages necessary within the chip, including writevoltage Vw (−10 V) applied to the word line on the basis of sourcevoltage Vcc, erasing voltage Ve (10 V), read voltage Vr (2 V), verifyvoltage Vpv (1 V), and the like. A power source selecting circuit 26 forselecting a desired one of these voltages in accordance with theoperating state of the memory is also provided, and supplies theselected voltage to the memory array 11, X-decoder 15 and the like.Incidentally, Vw and Ve, which are greater than the source voltage, aregenerated by an on-chip charge pump circuit included in the internalpower supply circuit 25.

[0060] In the flash memory according to this embodiment of theinvention, an address signal, a write data signal and a command inputshare an external I/O terminal (pin) in common, although no limitationis intended. Therefore, the I/O buffer 23 operates so as to distinguishbetween these input signals according to a control signal from thecontrol signal buffer 24, receives one of the input signals, and thensupplies it to a predetermined internal circuit.

[0061] The control signals fed from the external CPU and the like intothe flash memory according to this embodiment of the invention include,for example, a reset signal RES, a chip enable signal CE, a write enablesignal WE, an output enable signal OE, a command data enable signal CDE(for indicating whether the signal is a command, data input, or addressinput), a system clock signal SC, and the like.

[0062] An external general-purpose microcomputer LSI may be used tocontrol this apparatus because it is only necessary for the apparatus tobe equipped with an address generating function and a command generatingfunction.

[0063]FIG. 2 shows a specific example of a system for lowering thethreshold of a memory cell by writing, according to the teachings of thepresent invention. The memory array 11 according to this embodiment ofthe invention comprises two mats; FIG. 2 shows a specific example of oneof the memory mats. As shown in FIG. 2, each memory mat has a memorytrain MCC, including n parallel memory cells (MOSFETs having floatinggates) MC1-MCn, which are arranged in the vertical direction and whosesources and drains are commonly connected together. A plurality ofmemory trains MCC are arranged in the horizontal direction (in thedirection of word lines WL) and in the vertical direction (in thedirection of data lines DL).

[0064] In each of the memory trains MCC, the drains and sources of the nmemory cells MC1-MCn are connected to a common local data line LDL and acommon local source line LSL. The local data line LDL can be connectedvia a selection MOSFET Qs1 to a main data line DL, and the local sourceline LSL can also be connected via a selection MOSFET Qs2 to thegrounding point or negative voltage. Those memory trains MCC that arearranged in the direction of word lines are formed in the same well areaWELL on a semiconductor substrate.

[0065] Though not so limited, the system having the described memoryarray arrangement, and which assumes the erased state at high thresholdvoltage and the written state at low threshold voltage, may be called anAND type flash memory as shown in FIG. 2. At this time, injectingelectrons into the floating gate (which raise the threshold voltage toattain the erased state) employs, though not so limited, FN(Fowler-Nordheim) tunnel injection from a transistor channel, and FNtunnel emission to a diffusion layer is employed for drawing electronsfrom the floating gate (to lower the threshold voltage to attain thewritten state).

[0066] Those memory trains MCC that are arranged in the direction of theword lines are formed in the same well area WELL on the semiconductorsubstrate. A negative voltage of −3 V is applied to the well area WELLand the respective local source lines LSL when data is erased, and avoltage of 10 V is applied to the word lines having the common wellarea, making possible single-sector erasing. The selection MOSFET Qs2 isturned on at the time of erasing data, so that a negative voltage of −3V is applied to the source of each memory cell. At this time, theselection MOSFETs Qs1 are turned off and the drain is set at −3 V whenthe source-side voltage is applied through the channel of each memorycell which is turned on as the control gate is supplied with a highvoltage of 10 V.

[0067] On the other hand, a negative voltage of −10 V is applied to theword line connected to the selection memory cell at the time of writingdata, and the main data line DL corresponding to the selection memorycell is set at a potential of 3 V. Further, the selection MOSFET Qs1 onthe local data line LDL connected to the selection memory cell is turnedon and 3 V is applied to the drain. However, the selection MOSFET Qs2 onthe local source line LSL is turned off.

[0068] Further, a read voltage Vr (e.g., 2.0 V) is applied to the wordline connected to the selection memory cell at the time of reading dataand the main data line DL corresponding to the selection memory cell isprecharged at 1 V. Moreover, the selection MOSFET Qs1 on the local dataline LDL connected to the selection memory cell is turned on. Then, theselection MOSFET Qs2 on the local data line LDL connected to theselection memory cell is turned on and supplied with the groundingpotential (0 V). Thus, a transistor through which current flows inresponse to the threshold voltage of the memory cell (the LDL potentialis reduced to 0 V) is distinguished from another through which nocurrent flows (the LDL potential is kept at 1 V), whereby theinformation stored in the memory cell is read out.

[0069] The voltage at the time of writing and erasing data is lower thanthe voltage in the conventional types of FIGS. 18-19 because of thereduced element dimensions attained by the use of not only amicroprocessing technique, but also the 3 V source voltage Vcc insteadof the conventionally employed 5 V.

[0070] To one end of the main data line DL (on the central side of thememory array), a sense latch circuit SLT is connected for detecting thedata line level at the time of reading, and for applying a potentialcorresponding to write data at the time of writing. A data invertingcircuit WRW forms expected value data at the time of additional writing.The sense latch circuits (sense amplifier with latching function) SLTconstitutes the data register 12 in FIG. 1, and the data invertingcircuits WRW constitute the rewrite circuit 13. The two memory arraysformed in the two WELLs are called memory mat a (MATa). In this case thenumber of main data lines and SLTs are made to correspond to one sector;for example, 4224 (512+16 bytes) of them are provided in parallel.

[0071] Since two memory mats constitute the memory array according tothis embodiment of the invention, the data inverting circuit WRW and amemory mat b (MATb) (not shown) are arranged on the opposite side of thesense latch circuit SLT, that is, in the lower side of FIG. 2, and eachmain data line DL within the memory array is connected via thecorresponding data inverting circuit WRW to the other input/outputterminal of the sense latch circuit SLT. In other words, WRW is providedin each of MATa and MATb (called WRWa, WRWb when distinguished from eachother), and SLT is commonly used by the two memory mats.

[0072]FIG. 3 is a circuit diagram showing specific examples of the senselatch circuit SLT and the data inverting circuit WRW. Although there areshown one data line within the memory mat on one side and only onememory train MCC connected to the data line for convenience ofexplanation (because the circuit is symmetrical about the sense latchcircuit), actually a plurality of memory trains MCC are connectedthereto. As shown in FIG. 3, the sense latch circuit SLT is formed witha flip-flop circuit resulting from cross-linking the input/outputterminals of two CMOS inverters each having P-channel and N-channelMOSFETs. Further, column switches MOSFET Qya, Qyb forming “Y gates”,which are on/off controlled by the output of the Y-decoder, areconnected to a pair of input/output terminals Na, Nb of theaforementioned sense latch circuit SLT, respectively. The other ends ofthe plurality of column switches provided on a main data line basis arecommonly connected to complementary common input/output lines (IO, /IO).

[0073] The data inverting circuit WRWa includes a transmission MOSFETQt1 connected between one input/output terminal Na of the sense latchcircuit SLT and a main data line DLa within the memory mat on one side,a precharge MOSFET Qp1 which is connected between the source voltageterminal Vcc and the main data line DLa and controlled by a controlsignal PC2A, and MOSFETs Qt2, Qp2 connected between a prechargeswitching terminal VPC and the main data line DLa in series. Thepotential of the input/output terminal Na of the sense latch circuit SLTis applied to the gate of Qt2, whereas a control signal PC1A is appliedto the gate of Qp2. Moreover, the source voltage Vcc or Vss is suppliedto the precharge switching terminal VPC.

[0074] To the other input/output terminal Nb of the sense latch circuitSLT, a data inverting circuit WRWb including the MOSFETs Qt1, Qt2, Qp1,Qp2 arranged likewise is connected.

[0075]FIG. 4 shows a control procedure at the time of writing additionaldata by means of the control circuit 22. An additional write command forstarting the additional writing is designated by an 8-bit code set as acommand fed from the input/output terminal when the command enablesignal CDE of FIG. 1 is made effective. As will be described later,though the control circuit accepts an erase and a write commandadditionally, these commands are distinguished by a difference in code.The command numerical value is decoded by a command decoder and a seriesof programs corresponding thereto are started.

[0076] The control sequence is started when the additional write commandis taken in by the command register & decoder 21. When the controlsequence is started, an additional write mode is set up in the chip and“1” is set in the whole sense latch circuit SLT of the data register 12(Step S1). Subsequently, the write address fed from the outside isstored in the address register 14 (Step S2). Then at least oneadditional write data fed from the outside is stored in the dataregister 12 (Step S3).

[0077] When the write starting command is received in the commandregister & decoder 21 from the outside, further, a sector address(X-address) held in the address register 14 is decoded by the X-decoder15, and one word line in the memory array 11 is selected and set at aread level of 2 V. Thus, data equivalent to one sector are read out intothe data register 12, and write expected value data are created on thebasis of the additional write data and held in the data register 12(Step S4). The processing stated above is automatically performed by therewrite circuit 13 (data inverting circuit WRW) under the control of thecontrol circuit (sequencer) 22.

[0078] Subsequently, 10 V and an erase pulse of −3 V are applied to theselection word line and the well region, respectively, so that thethreshold of all memory cells of the sector involved is raised to attainthe erased state (Step S5). Thus, the stored data having “0” in thememory cell is changed to “1” as the threshold is raised to Vev orgreater as shown in FIG. 10(e), and disturbance is recovered in thememory cells with the stored data having “1” as shown in FIG. 10(c). Inthis case, the disturbance related to the memory cells where the storeddata are “1” has been caused when another memory cell in the same sectorhas been written.

[0079] Although there has been shown an example of raising the thresholdof all memory cells of the sector to Vev or greater at Step S5 of FIG.4, the present invention is not limited to this example, but is, asshown in FIG. 23(e), applicable to a case where the threshold of thememory cells with data already written thereto in the sector is raisedto the extent that it exceeds voltage Pcv.

[0080] The operation of not collectively raising the threshold of allmemory cells of the sector to the voltage Vev but raising it close tothe high potential side is called pseudo-erasing for convenience ofexplanation. When compared with the operation of collectively erasingall memory cells of the sector, the pseudo-erasing is distinguished bythe voltage application time from the former, though the voltage appliedto the memory array is similar. In other words, 10 V is applied to theselection word line normally for 1 ms in order to completely erase thememory cells in the written state by executing an erase command asdescribed in FIG. 14 later, whereas in the case of the pseudo-erasing,approximately 0.1 ms, which is about {fraction (1/10)}, is considered tobe satisfactory.

[0081] Therefore, the threshold voltage of the first memory cell groupin the second state within one sector is not completely changed up tothe threshold voltage in the first state but remains in between thefirst and second state. Moreover, the threshold voltage of the secondmemory cell group in the first state, as the remainder of the firstmemory cell group in the same sector, is changed in the voltagedirection in which the threshold voltage is gradually raised (i.e., thevoltage direction in which the second state of the threshold voltage ischanged to the first state). More specifically, the pseudo-erasingoperation is not intended to erase the memory cell completely, but tochange the threshold voltage in the opposite voltage direction to theextent that the change is offset in expectation of variation in thethreshold voltage in the voltage direction from the first state to thesecond state caused by word disturbance.

[0082] Then the selection word line is set at −10 V and the data lineuses the expected value data created at Step S4 and held in the dataregister (sense latch SLT) 12 to selectively set the voltage level ofLDL at 3 V, and writes data to the above erased sector (Step S6). Thevoltage level of LDL that is not written is set at 0 V. Then, verifyvoltage Vepv is used for reading and determining whether or not thethreshold has been lowered sufficiently, by deciding whether the dataheld in the data register 12 have been totally set to “0” (Step S7). Ifany “1s” are left, the presence of a high-threshold memory is decidedand Step S6 is followed again, whereupon the data then held in the dataregister 12 are used to repeat the verifying operation again.

[0083] During the process of repeating the verifying operation, thememory cells whose threshold has been lowered sufficiently (thethreshold voltage is lower than the verify voltage Vpv) are arranged sothat they are prevented from being written with the voltage level of LDLset at 0 V. Then the remaining memory cells whose threshold has not beenreduced sufficiently are selectively written and, when the thresholdvoltage of the memory cell group to be written is totally sufficientlylowered, rewriting and verifying are suspended.

[0084] The write verify corresponds to a variation in writing time ofthe memory cells in the same sector. In other words, the memory cellsset at the threshold in the first and second states because of thepseudo-erasing have write times far shorter than that of the memory cellwhose threshold is changed from the first state to the second state.With the use of write verify, variation in the threshold voltage at thetime of writing is suppressed and the threshold voltage is effectivelyprevented from becoming Vss or lower.

[0085] FIGS. 5-8 show signal timings in each component of the memoryarray and the data inverting circuit WRW in detail at the time ofgenerating the write expected value data at Step S4 in the additionalwriting flow described above. FIGS. 5-8 show signal timings for theright-hand side memory mat MATa in the memory array shown in FIG. 3.Further, Table 1 shows variation in the data held in the data register12 and the data line level during the process of generating theaforementioned write expected value data in the order of time from up todown. TABLE 1 UNUSED USED MEMORY DATA 1 1 1 1 1 1 1 1 1 0 1 0 1 0ADDITIONAL DATA 1 0 0 1 0 0 1 0 — — — — — — DATA LINE & REGISTER t1 H LL H L L H L H H H H H H t2 H L L H L L H L H L H L H L t5 1 0 0 1 0 0 10 1 0 1 0 1 0 t6 H H H H H H H H H H H H H H t7 L H H L H H L H L H L HL H t10* 0 1 1 0 1 1 0 1 0 1 0 1 0 1

[0086] As shown in Table 1, the additional write data are stored in thepredetermined bits of the data register (sense latch SLT) 12. Asdescribed above, data “1” (i.e., the threshold is not varied at thisstage) is set in the sense latch SLT corresponding to the memory cellnot to be additionally written (the memory cell to which data hasalready been written) in the same sector. In other words, though theitem of additional data in a column being used is shown by “-” in orderto make it clear that no addition writing is made in Table 1, the timeis actually “1”. Moreover, Vcc (high level) is initially supplied to thevoltage source selector terminal VPC in the data inverting circuit WRW.

[0087] As shown in FIG. 5, signals PC2B, PC1A are first caused to rise(t1) in that state, whereby the MOSFET Qp1 in the data inverting circuitWRW in MATb on the non-selection side is turned on, so that a pluralityof main data lines DLb are precharged at a reference potential (e.g.,0.5 V). On the other hand, the MOSFET Qp2 in the data inverting circuitWRW in MATa on the selection side is turned on and the MOSFET Qt2 isturned on when the data held in the sense latch SLT is “1” and turnedoff when it is “0”. Therefore, the main data line DLa corresponding to“1” of the data held in the sense latch SLT is precharged at 1 V and themain data line DLa corresponding to “0” of the data thus held is set atVss (low level). Since the data “1” has been set in the sense latch SLTcorresponding to the memory cell not to be additionally written (thememory cell to which data has already been written), the correspondingmain data lines DLa are totally precharged at 1 V.

[0088] Subsequently, one word line, a local drain selection signal SD,and a local source selection signal SS are caused to rise, and theselection MOSFET Qs1 in the memory array is turned on (timing t2 of FIG.5), whereby since the memory cells (low threshold) with data “0” alreadywritten is turned on, the corresponding main data line DLa is dischargedand set at the low level. On the other hand, the corresponding main dataline DLa remains at the high level since the memory cells (highthreshold) with stored data of “1” are turned off. Further, since theunwritten (in the erased state) memory cells (high threshold) are turnedoff, the main data line DLa corresponding to additional write data of“1” held in the sense latch SLT is set at 1 V, and the main data lineDLa corresponding to additional write data of “0” is set at Vss.

[0089] Subsequently, the source voltages SLP, SLN of the sense latch SLTare reset (SLP=SLN=0.5 V) and the data thus held is canceled once(timing t3 of FIG. 5). Then a signal TR is set at the high level and thetransmission MOSFET Qt1 on the data line is turned on so as to transferthe potential of the data line to the sense latch SLT (timing t4 of FIG.5). Further, the source voltages of the sense latch SLT are put in aforward bias state to amplify the potential of the data line (timing t5of FIG. 5). FIGS. 6(a)-6(b) show variation in the input/output node ofthe sense latch SLT and potential of the main data lines DLa, DLb whenthe aforementioned signal timing is followed.

[0090] In FIGS. 6(a)-6(c), symbol DAi represents the potential of theinput/output node Na on the mat MATa (the right-hand mat in FIG. 3) sideof the sense latch SLT; DBi, the potential of the input/output node Nbon the mat MATa (the left-hand mat, not shown in FIG. 3) side of thesense latch SLT; GDLAi, the potential of the main data line DLa on themat MATa; and GDLBi, the potential of the main data line DLb on the matMatb. Further, FIG. 6(a) shows waveforms in a case where the presentstate of the selection memory cell is the written state (low threshold);FIG. 6(b) shows waveforms in a case where the present state of theselection memory cell is the erased state (high threshold) and no datais written by additional writing; and FIG. 6(c) shows waveforms in acase where the present state of the selection memory cell is the erasedstate (high threshold) and data is written by additional writing.

[0091] As shown in FIG. 7, the signal TR is set at the low level and thetransmission MOSFET Qt1 is turned off to cause signals. PC2A, PC2B torise (timing t6) in such a state that the data line is cut off from thesense latch SLT. At this time, the MOSFET Qp1 in the data invertingcircuit WRW is turned on and the main data lines DLa, DLb are prechargedat 1 V and 0.5 V, respectively. Then the voltage source selectorterminal VPC in the data inverting circuit WRW is switched over to Vssand the signal PC1A is caused to rise (timing t7 of FIG. 7).

[0092] Further, the MOSFET Qp2 in the data inverting circuit WRWa isturned on at the selection side, and the MOSFET Qt2 is turned on inresponse to the data “1” held in the sense latch SLT and turned off inresponse to the data “0”. Therefore, the main data line DLacorresponding to the data “1” held in the sense latch SLT is dischargedto Vss (low level) and the main data line DLa corresponding to the data“0” held therein is left at 1 V (high level). In other words, a state inwhich the date held in the data register 12 is inverted appears on thedata line on the selection side.

[0093] Subsequently, the source voltages SLP, SLN of the sense latch SLTare reset and the data thus held is canceled once (timing t8 of FIG. 7).Then a signal TR is set at the high level and the transmission MOSFETQt1 on the data line is turned on so as to transfer the potential of thedata line to the sense latch SLT (timing t9 of FIG. 7). Further, thesource voltages of the sense latch SLT are put in a forward bias stateto amplify the potential of the data line (timing t10 of FIG. 7). Thus,write expected value data, reduced to “1” only by the sense latch SLTcorresponding to a memory cell to be written, is held in the dataregister 12. The write expected value data will readily be understoodfrom Table 1 as being prepared by arranging additional write data andthe data stored in the memory cell already written, and inverting thecombination.

[0094] In the flash memory according to this embodiment of theinvention, while the write expected value data is held in the dataregister 12, all the memory cells in the sector involved are put in theerased state (high threshold) or subjected to pseudo-erasing by applyingthe erase pulse to the selection word line and the well area in such astate that the transmission MOSFET Qt1 on the data line has been turnedoff. Then the write expected value data held in the data register 12 areused to carry out desired additional writing by precharging only thedata line with the held data “1” at a level of 3 V so as to apply −10 Vto the selection word line. Consequently, the threshold of the memorycell that has not been connected to the precharged data remainsunchanged and the stored data becomes “1”, whereas the threshold of thememory cells connected to the precharged data are lowered, whereby thestored data becomes “0”.

[0095] In this case, the erase time can be curtailed because thethreshold of the memory cell in the erased state at the time the erasepulse is applied need only exceed the minimum write verify voltage.

[0096] FIGS. 8(a) and 8(b) show variation in the input/output node ofthe sense latch SLT and the potential of the main data lines DLa, DLbwhen the aforementioned signal timing is followed. FIG. 8(a) showswaveforms after a case where the potential of the matA-side input/outputnode of the sense latch SLT remains at the high level on the terminationof the operation of FIG. 5 (timing t5), and FIG. 8(b) shows waveformsafter a case where the potential of the matA-side input/output node ofthe sense latch SLT remains at the low level on the termination of theoperation of FIG. 5 (timing t5).

[0097] FIGS. 9(a)-9(c) show the state of variation in the thresholdbefore and after additional writing to each memory cell. FIG. 9(a) showsvariation of the memory cell in the prior-to-write state in whichadditional write data is “1” at erasing (stored data “1”) is “1”; FIG.9(b) variation of the memory cell in the prior-to-write state in whichadditional write data at ‘erasing (stored data “1”) is “0”’; and FIG.9(c) variation of the threshold of the memory cell in the prior-to-writestate in which additional write data is absent at ‘writing (stored data“1” is “0”)’. In FIGS. 9(a)-9(c), the gentle slope tilting toward theright means a reduction in threshold due to disturbance. Those shown bya broken line in FIGS. 9(a)-9(c) refer to variation in the threshold ina case where the initial writing has also been carried out by the use ofthe additional write command. In other words, writing using theadditional write command is effective since disturbance occurs even inthe case of writing immediately after the single sector erasing of thememory cell.

[0098] Table 2 shows the relation among the state of the memory cell(stored data), additional write data, and the write expected value data.Symbols A, B, C in Table 2 represent corresponding variations in thethreshold of the memory cell in FIGS. 9(a)-9(c) TABLE 2 WRITE STATE OFTHE ADDITIONAL EXPECTED MEMORY CELL WRITE DATA VALUE DATA UNUSED (A)ERASE (“1”) 1 0 (NO WRITE) (B) ERASE (“1”) 0 1 (WRITE) USED (C) WRITE(“0”) — 1 (WRITE) (A) ERASE (“1”) — 0 (NO WRITE)

[0099] FIGS. 10(a)-10(f) show variation in the threshold of each memorycell by applying additional write control according to this embodimentof the invention. FIGS. 10(a)-10(f) collectively show a diagramillustrating a transition state of the threshold of a memory cell groupin one sector with the X-axis representing voltage and the Y-axisrepresenting the degree of a memory cell at a specific thresholdvoltage.

[0100] In FIGS. 10(a)-10(f), a first state of the threshold voltage(erased state, logical state “1”) and a second state thereof (writtenstate, logical state “0”) are defined. More specifically, the thresholdvoltage of the memory cell for determining the storage state of thememory cell is Vev or higher in the first state, and ranges from Vss toVpv in the second state, in either case of which it is not a voltage athaving a specific value, but falls within a predetermined range (Vss toVpv). According to this embodiment of the invention, as shown in FIGS.10(a)-10(c), the threshold of the memory cell whose threshold haslowered, as shown by a broken line due to disturbance at the time ofinitial writing, can be recovered.

[0101] Although a detailed description has not been given before, if aspecific memory cell group is written after one sector is subjected tosingle-sector erasing, the remaining memory cells undergo worddisturbance from the beginning. FIGS. 10(a) and 10(b) show variation inthe threshold in a case where the first memory cell group (in the erasedstate) is not written in an unused area where the threshold voltage isin the first state within the same sector, and FIGS. 10(c) and 10(d)show variation in the threshold in a case where the first memory cellgroup is written in that unused area. Moreover, FIGS. 10(e) and 10(f)show variation in the threshold of the second memory cell group in whichthe threshold voltage in a usable area is in the second written state.As is obvious from these figures, even the written memory cell is put inthe erased state once before being put in the written state according tothis embodiment of the invention.

[0102] Although a description has been given of a case where the sectoris divided into a usable and an unused area in the above embodiment ofthe invention, the present invention is not limited to that case but maybe implemented so that the above unused area is divided into a pluralityof sections to make additional writing possible on a section basis.

[0103] Further, although a description has been given of a flash memorysystem in which the threshold is lowered with a write pulse afterperforming the erasing operation once to raise the threshold at the timeof writing data according to the above embodiment of the invention, sucha system may raise the threshold with the write pulse after lowering thethreshold of the memory cell through the erasing operation.

[0104] The flash memory formed on one chip as shown in FIG. 1 accordingto the first embodiment of the invention includes at least a readcommand (shown in FIG. 13), the erase command (FIG. 14) for collectivelyputting the threshold voltage of memory cells in one sector in the firststate, and the write command (FIG. 15—first write-command) in additionto the additional write command (second write command). A detaileddescription will be given of procedures of FIGS. 13-14 later. It takesabout 1 ms to change the memory cell group in one sector from the secondstate in threshold to the first state by executing the erase command. Italso takes about 1 ms to change the memory cell group from the firststate in threshold to the second state by executing the write command.

[0105] The function and the effect of the present invention are achievedaccording to the above embodiment as follows: When the additional writecommand of FIG. 4 is compared with the write command first, theadditional write command features a procedure at Steps S4-S5.Synthesizing final write data at Step S4 automatically contributes tosaving write time.

[0106] A comparison made in terms of the voltage applied to the wordline, which characteristically determines the voltage direction of thethreshold voltage, includes a step of applying only +10 V for about 1 mswith the erase command of FIG. 14, and a step of applying only −10 V forabout 1 ms with the write command of FIG. 15. Moreover, it is featuredthat a step of applying −10 V which is followed by applying +10 V istaken in reference to FIG. 4. Further, the time required to apply +10 Vin the case of pseudo-erasing at Step S5 is far shorter than the timerequired to apply +10 V with the erase command.

[0107] In the method of saving write data of one sector in SLT once,subjecting the memory cell to complete single sector erasing (about 1ms) with the erase command, and then writing (about 1 ms) the finalwrite data synthesized from the data saved in SLT and new write datawith the write command in order to avoid disturbance, requires a totalof about 2 ms or more. On the other hand, the use of the additionalwrite command using the pseudo-erasing results in completing the writingoperation in about 1.1 ms, or about half the time, as writing iseffected (about 1 ms) after the pseudo-erasing (about 0.1 ms). Since thedisturbance is compensated for by the pseudo-erasing, the additionalwrite command makes it unnecessary to completely erase the sector byexecuting the erase command prior to executing the additional writecommand, as is required by the conventional system.

[0108] Further, since the word disturbance is greatly eased, theadditional write command may be executed many times without executingthe erase command. Even when the additional write command iscontinuously executed about 15 times or more without executing the erasecommand, the data stored in the same sector remains assured. Thecontinuous repetition of erasing-writing 15 times requires about 30 msaccording to the prior art, whereas the continuous execution of theadditional write command 15 times, plus only one erase command, total17.5 ms, so that the write time according to the invention is muchshorter.

[0109] <Embodiment 2>

[0110]FIG. 11 shows a memory array of the aforementioned system forincreasing the threshold using the write pulse.

[0111] The difference between the memory array according to thisembodiment of the invention and the memory array (see FIG. 2) accordingto the preceding embodiment lies in the direct connection of the drainsof memory cells MC1-MCn to respective main data lines DL, omittingselection MOSFETs Qs1, Qs2, and the connection of the sources of thememory cells MC1-MCn to a common source line CSL. However, both thememory arrays are similar in that a line of memory cells are connectedin parallel.

[0112] Moreover, in the memory array according to this embodiment of theinvention, the definition of the threshold voltage of the memory cell atthe time of writing and erasing data is opposite to what is given in theembodiment thereof in FIG. 2. The memory array shown in FIG. 11 may becalled a NOR-type flash memory, although the array is not so limited. Atthis time, the injection of electrons into the floating gate (to raisethe threshold voltage to attain the written state) uses, though not solimited, CHE (Channel Hot Electron) injection from the drain of thetransistor, and FN tunnel emission for drawing electrons from thefloating gate (to lower the threshold voltage to attain the erasedstate).

[0113] According to this embodiment of the invention, as shown in Table3, a voltage as high as 10 V is applied to the control gate CG, whereasthe grounding potential (0 V) is applied to the source. On the otherhand, different voltages depending on selection/non-selection areapplied to the drain. In other words, a voltage of 5 V is applied to thedrain of the selection memory cell to turn it on to put the memory cellin the ON state, thus causing current to flow across the source anddrain, and the hot electrons generated then are injected into thefloating gate, thereby raising the threshold of the memory cell forwriting. Further, 0 V is applied to the drain, like the source, of thenon-selection memory cell, and the threshold of the memory cellconsequently remains low because no current flows across the source anddrain of the memory cell. TABLE 3 CG DRAIN SOURCE WRITE 10 5/0 0 ERASE−10 FLOATING 5 READ 5 1 0

[0114] At the time of erasing data, a negative voltage of −10 V isapplied to the control gate CG, and the drain is reduced to a floatingstate in which no voltage is applied. Further, a positive voltage of 5 Vis applied to the source, whereby electrons are drawn from the floatinggate of the memory cell so as to lower the threshold of the memory cell.This erasing operation is performed by the sectors sharing the word linein common. As 5 V is applied to the control gate, 0 V to the source, and1 V to the drain of the memory cell at the time of reading dataaccording to this embodiment of the invention, no drain current flowsthrough the memory cell having a high threshold, whereas the draincurrent flows through the memory cell having a low threshold.Consequently, data is read out by detecting the lowering of theprecharge level of the data line.

[0115] If additional write control similar to that in the precedingembodiment of the invention is applied, it is also possible in thisembodiment of the invention to recover the threshold of the memory cellwhose threshold has risen because of disturbance at the time of initialwriting as shown by broken lines in FIGS. 12(a) and 12(c). FIGS. 12(a)and 12(b) show variation in the threshold in a case where the memorycell (in the erased state) in the unused area is not written; FIGS.12(c) and 12(d) show variation in the threshold in a case where thememory cell in the unused area is written; and FIGS. 12(e) and 12(f)variation in the threshold of the memory cell in the written state inthe usable area. Thus, even the written memory cell is put in the erasedstate once and then in the written state again according to thisembodiment of the invention. Further, FIGS. 24(a)-24(f) show thatvariation in the threshold of the memory cell may be set so that it isslightly lower than voltage Vpv.

[0116] In summary, in Embodiment 2, an effect similar to that ofEmbodiment 1 is achievable by reversing the high and low levels ofthreshold voltage in the first state and the second state.

[0117] <Embodiment 3>

[0118] FIGS. 13-15 show another embodiment of the invention. Accordingto this embodiment of the invention, a data read command, an erasecommand, and a write command from an external control unit are generallyused for carrying out additional writing without supplying the flashmemory with the additional write command and the expected value datafunction as in the preceding embodiment of the invention. The flashmemory to which this embodiment of the invention is applicable has asequencer that is capable of at least decoding a data read command, anerase command, and a write command as well as a start command, andexecuting these commands. Of these commands, the start command is notnecessarily required, and the flash memory may be arranged so that it isautomatically started.

[0119] A nonvolatile memory has a memory array and a sequencer which areformed on one chip and the sequencer is at least capable of executingbasic instructions including a read command (FIG. 13), an erase command(FIG. 14), and a write command (FIG. 15). As described with reference toEmbodiment 1, the voltage application time of the word line with theerase command and executing steps are changeable so that completesingle-sector erasing and the above described pseudo-erasing can becarried out. A second erase command that is different in erase time maybe provided for special use in pseudo-erasing. At this time, eraseverify of the erase command is unnecessary.

[0120] The additional write command according to the present inventionis in the form of a macro command for executing the three basicinstructions above successively and continuously. The command may bedistributable to a magnetic medium or the like as a program executableby the CPU of, for example, a personal computer. Therefore, the“sequencer” in this embodiment is a combination of a sequencer in thenarrow sense of a memory chip and an external CPU.

[0121] Moreover, the additional command may be in the form of anadditional program as a nonvolatile memory driver or often combined intothe OS of a computer. Therefore, this embodiment can be part of acomputer system having a nonvolatile memory chip capable of executingthe three basic instructions, and a CPU to which the memory chip isconnected.

[0122] The following description refers to FIGS. 13-15.

[0123] When additional writing is carried out according to thisembodiment of the invention, a data read command is first fed from anexternal control unit to the flash memory and a sector address issubsequently fed. The sector address is equivalent to a location towhich data is additionally written later. When the flash memory issupplied with the data read command, it sets each circuit in the memoryin a read mode (Step S11 of FIG. 13). When the address is input then, itis stored in an address register (Step S12).

[0124] When a start command is input from the outside, the address datastored in the address register is read from a memory array and outputexternally. The external control unit stores the data that has beenoutput from the flash memory in a predetermined save area within anexternal memory. Further, the external control unit creates writeexpected value data from the read data stored in the save area andadditional write data, and holds the write expected value data in theexternal memory.

[0125] Subsequently, an erase command and a sector address are fed fromthe external control unit into the flash memory. Then the flash memorysets each circuit of the memory in an erase mode and stores the addressthus input in the address register (Steps S21, S22 of FIG. 14). When thestart command is input, the flash memory applies a bias voltage forestablishing an erased or pseudo-erasing state to a memory cellcorresponding to the sector address set by the address register so as tovary the threshold (Step S23). Then the flash memory effects a verifyread to confirm whether or not the data has been erased, the processreturns to Step S23 when it has not been erased yet, and applies anerase pulse to the memory cell again (Steps S24, S25). The erase verifyat S23-S25 is utilized at the time of normal erasing, but is not used atpseudo-erasing.

[0126] Then the write command, the sector address and the write expectedvalue data are successively input from the external control unit to theflash memory, whereupon the flash memory sets the write mode in each ofthe circuits in the memory, and stores the address thus input in theaddress register and the write expected value data in the data register(Steps S31, S32, S33 of FIG. 15). When the start command is inputsubsequently, the flash memory applies the write pulse to the memorycell corresponding to the sector address set in the address register soas to vary the threshold (Step S34). Then the flash memory effects averify read to confirm whether or not the data has been written, andreturns to Step S34 when the data has not been written, so as to applythe write pulse to the memory cell again (Steps S35, S36).

[0127] Although a description has been given of a macro additional writecommand as the combination of three basic instructions including theread, erase, and write commands, an effect similar to that obtainable inEmbodiment 1 can be anticipated with respect to the additional writingthat can be carried out by avoiding the word disturbance withoutexecuting the erase instruction. However, the effect of saving theprocedure at Step S4 of FIG. 4 for outputting the write data externallyfrom the memory chip becomes less distinct than the embodiment of FIG.4.

[0128]FIG. 16 shows still another embodiment of the invention, whereinlike reference numerals designate like component parts, and the repeateddescription thereof will be omitted. According to this embodiment of theinvention, there are provided a data saving register 27 for use as thesave area according to the preceding embodiment thereof, and anarithmetic circuit (corresponding to write expected value data) 28 foroperating on write expected value data in the flash memory. Thesequencer 22 according to this embodiment of the invention has afunction of decoding an additional write command fed from an externalcontrol unit and controlling the data saving register 27 and thearithmetic circuit 28 at proper timings so as to carry out additionalwriting.

[0129] <Embodiment 4>

[0130]FIG. 17 shows a memory card as an application of the flash memoryaccording to the above-described embodiments of the invention. A memorycard 100 comprises a plurality of flash memory chips 10 and a controllerchip 110 for controlling read/write operations. A bus (not shown)provided in the card is used to connect the controller chip 110 and theflash memory chips 10. The aforementioned additional write command andother commands, a sector address, write data, and control signals suchas a write enable signal are supplied from the controller chip 110 viathe bus to the flash memory chips; terminals/conductors 120 are providedalong one side of the card for signal input/output and power supply.

[0131] A description has been given of a nonvolatile memory array for aflash memory, and of a command sequencer for executing instructions,mounted on one chip in Embodiments 1 and 2 of the invention, which mayalso be implemented in the form of a card as shown in FIG. 17. In thiscase, importance is attached to a nonvolatile memory system in which thecontroller chip 110 at least follows an additional write commandprocedure of FIG. 4.

[0132] Other aspects of implementing the present invention, other thanthe memory card as mentioned above, include a memory card comprising aplurality of flash memory chips with the omission of the controller chip110, and a personal computer including a CPU to which the aforementionedmemory card is connectable. In this case, a program for the CPU containsall commands such as an erase command and a write command necessary forcontrolling the flash memory; further, the additional write command ofFIG. 4 or the macro additional write command as the combination of basicinstructions of FIGS. 13-15 may be used for this purpose.

[0133] As set forth above, according to the above-described embodimentsof the invention, the data stored in a sector at a designated address isread and saved in the register when the predetermined command is issuedand the sector is subjected to single-sector erasing. Then, the actualfinal write data (write expected value data) is formed from the saveddata and data to be additionally written and used to perform the writingoperation. Therefore, this arrangement has the effect of preventingerror data from being read since variation in the threshold of thememory cell due to the disturbance related to the word line is recoveredat the time of additional writing.

[0134] When additional write data is fed from the outside while the dataread from the selected sector is held in the internal register, thewriting operation is performed after the write expected value data isautomatically and internally formed. Therefore, the additional writingoperation can be performed quicker than the ordinary writing operationwith the effect of lightening the burden imposed on software at the timeof additional writing.

[0135] Consequently, it is possible to provide, within the same sector,a mixture of the system area intended for information that is not openedto general users (such as OS and sector control information) and theuser area to which the user is allowed to freely write data in the caseof flash memories according to above-described embodiments of theinvention as shown in FIGS. 22(a)-22(f), whereby the memory iseffectively utilizable. This is due to the fact that, in a flash memoryof such a storage system, predetermined data is written to the systemarea and the user area is offered to the user in the unwritten state,and because the additional writing operation is performable when theuser writes data thereto.

[0136] Control data of FIGS. 22(a)-22(f) include, for example, paritycodes, error correction codes, the number of times the sector involvedis rewritten, and whether or not the sector contains bad bits; sectioncontrol information indicative of the usable/unused condition of asection when the sector is divided into a plurality of sections so thateach section is additionally writable; and the like.

[0137] Although a detailed description has been given of the presentinvention on the basis of preferred embodiments thereof, the presentinvention is not limited to these embodiments but may be modifiedwithout departure from the spirit and scope of the invention. Forexample, a description has been given of the case where the two matshave been used to constitute the memory array according to theembodiments of the invention, the present invention is not so limited,but may be applicable to a case where the memory array is divided into aplurality of mats or formed with one mat.

[0138] Further, although a description has been given of a flash memoryof the single-sector erasing type, the invention is not so limited, butmay be widely applicable to nonvolatile memories with FAMOS storageelements, and to semiconductor devices provided with memory cells eachhaving a plurality of thresholds.

[0139] The effect obtained from the representative embodiments of theinvention disclosed in the present patent application are brieflysummarized as follows:

[0140] According to the present invention, variation in the threshold ofthe memory cell due to the disturbance related to the word line in thenonvolatile semiconductor memory is recovered and error data isprevented from being read out. Further, the additional writing operationcan be performed quicker than the ordinary writing operation with theeffect of lightening the burden imposed on software at the time ofadditional writing.

We claim:
 1. A non-volatile memory system, comprising: a memory arrayincluding a plurality of memory cells in which each memory cell stores adata by threshold voltage corresponding to a first state and a secondstate, and a word line coupled to gates of the plurality of memorycells; and a sequencer which controls procedures of changing thethreshold voltage of the plurality of memory cells in response tocorresponding commands; wherein the plurality of memory cells includes afirst group of memory cells having a threshold voltage corresponding tothe first state, and a second group of memory cells having a thresholdvoltage corresponding to the second state; wherein said sequencerincludes an erase command procedure which puts the threshold voltage ofthe plurality of memory cells into the first state, and a write commandprocedure which puts the threshold voltage of at least a selected one ofthe first group of memory cells into the second state; and wherein thewrite command procedure includes a first step in which the thresholdvoltage of the second group of memory cells is changed toward a voltagedirection from the first state to the second state, and a second step inwhich the threshold voltage of the second group of memory cells and atleast a selected one of the first group of memory cells are changed tothe second state.
 2. A non-volatile memory system according to claim 1,wherein in the first step, the threshold voltage of the first group ofmemory cells is changed toward the voltage direction from the firststate to the second state while the threshold voltage of the secondgroup of memory cells is changed toward the voltage direction from thefirst state to the second state.
 3. A non-volatile memory systemaccording to claim 2, wherein in the first step, the threshold voltageof the second group of memory cells is temporarily changed between thefirst state and the second state.
 4. A non-volatile memory systemaccording to claim 2, wherein in the first step, the threshold voltageof the second group of memory cells is temporarily changed to the firststate.
 5. A non-volatile memory system, comprising: a memory arrayincluding a plurality of memory cells in which each memory cell stores adata by threshold voltage corresponding to a first state and a secondstate; a word line coupled to gates of the plurality of memory cells; aplurality of data lines, each data line being coupled to each of theplurality of memory cells; a plurality of sense latches, each senselatch being coupled to each of the plurality of data lines; and a datainput/output terminal coupled to the plurality of data lines; and asequencer which controls procedures of changing the threshold voltage ofthe plurality of memory cells in response to corresponding commands;wherein the plurality of memory cells includes a first group of memorycells having a threshold voltage corresponding to the first state, and asecond group of memory cells having a threshold voltage corresponding tothe second state; wherein said sequencer includes an erase commandprocedure which puts the threshold voltage of the plurality of memorycells into the first state, and a write command procedure which puts thethreshold voltage of at least a selected one of the first group ofmemory cells into the second state; and wherein the write commandprocedure includes a first step of storing a first data inputted fromthe input/output terminal to each of the plurality of sense latches; asecond step of reading a second data from each of the plurality ofmemory cells onto each of the plurality of data lines, synthesizing athird data from the first data and the second data, and storing thethird data in each of the plurality of sense latches; a third step ofchanging the threshold voltage of the plurality of memory cells toward avoltage direction from the second state to the first state; and a fourthstep of putting into the second state the threshold voltage of at leastone of the memory cells indicated by the third data.
 6. A non-volatilememory system according to claim 5, wherein the threshold voltage of thesecond group of memory cells is temporarily changed between the firststate and the second state during the third step.
 7. A non-volatilememory system according to claim 5, wherein the threshold voltage of thesecond group of memory cells is temporarily changed to the first stateduring the third step.
 8. A non-volatile memory system, comprising: amemory array including a plurality of memory cells in which each memorycell stores a data by threshold voltage corresponding to a first stateand a second state, and a word line coupled to gates of the plurality ofmemory cells; and a sequencer which controls procedures of changing thethreshold voltage of the plurality of memory cells in response tocorresponding commands; wherein the plurality of memory cells includes afirst group of memory cells having a threshold voltage corresponding tothe first state, and a second group of memory cells having a thresholdvoltage corresponding to the second state; wherein said sequencerincludes an erase command procedure which puts the threshold voltage ofthe plurality of memory cells into the first state by applying a firstvoltage to the word line, and a first write command procedure which putsthe threshold voltage of at least one of the first group of memory cellsinto the second state by applying a second voltage to the word line; andwherein said sequencer also includes a second write command procedurewhich puts the threshold voltage of at least one of the first group ofmemory cells into the second state by applying the first voltage and thesecond voltage to the word line.
 9. A non-volatile memory systemaccording to claim 8, wherein the time required to apply the firstvoltage to the word line in the second write command procedure isshorter than the time required for the erase command procedure.
 10. Anon-volatile memory system according to claim 8, wherein the thresholdvoltage of the second group of memory cells is temporarily changedbetween the first state and the second state by applying the firstvoltage to the word line during the second write command procedure. 11.A non-volatile memory system according to claim 8, wherein the timerequired to apply the first voltage to the word line of the second writecommand procedure is substantially the same as the time required for theerasing command procedure.
 12. A non-volatile memory system according toclaim 8, wherein the threshold voltage of the second group of memorycells is temporarily changed to the first state by applying the firstvoltage to the word line during the second write command procedure. 13.A non-volatile memory system according to claim 8, wherein said memoryarray also includes a plurality of data lines, each data line beingcoupled to each of the plurality of memory cells; a plurality of senselatches, each sense latch being coupled to each of the plurality of datalines; and a data input/output terminal coupled to the plurality of datalines; wherein the second writing command procedure includes a firststep of storing a first data inputted from the input/output terminal toeach of the plurality of sense latches; a second step of reading asecond data from each of the plurality of memory cells to each of theplurality of data lines, synthesizing a third data from the first dataand the second data, and storing the third data into each of theplurality of sense latches; a third step of applying the first voltageto the word line and changing the threshold voltage of the plurality ofmemory cells toward a voltage direction from the second state to thefirst state; and a fourth step of applying the second voltage to theword line and putting into the second state the threshold voltage of atleast one of the memory cells indicated by the third data.
 14. Anon-volatile memory system according to claim 13, wherein the timerequired for applying the first voltage to the word line of the secondwriting command procedure is shorter than the time required for theerase command procedure.
 15. A non-volatile memory system according toclaim 13, wherein the threshold voltage of the second group of memorycells is temporarily changed between the first state and the secondstate by applying the first voltage to the word line during the thirdstep.
 16. A non-volatile memory system according to claim 13, whereinthe time required for applying the first voltage to the word line of thesecond writing command procedure is substantially the same as the timerequired for the erase command procedure.
 17. A non-volatile memorysystem according to claim 13, wherein the threshold voltage of thesecond group of memory cells is temporarily changed to the first stateby applying the first voltage to the word line during the third step.18. A non-volatile memory system according to claim 1, wherein saidmemory system is a semiconductor device formed on a semiconductorsubstrate.
 19. A non-volatile memory system according to claim 5,wherein said memory system is a semiconductor device formed on asemiconductor substrate.
 20. A non-volatile memory system according toclaim 8, wherein said memory system is a semiconductor device formed ona semiconductor substrate.
 21. A non-volatile memory system according toclaim 1, wherein said memory system is a memory card; and wherein thememory card has a memory chip including said memory array and a controlchip including said sequencer.
 22. A non-volatile memory systemaccording to claim 5, wherein said memory system is a memory card; andwherein the memory card has a memory chip including said memory arrayand a control chip including said sequencer.
 23. A non-volatile memorysystem according to claim 8, wherein said memory system is a memorycard; and wherein the memory card has a memory chip including saidmemory array and a control chip including said sequencer.
 24. Anon-volatile memory system according to claim 1, wherein said sequencerhas a memory for storing the command procedures and conditions.
 25. Anon-volatile memory system according to claim 5, wherein said sequencerhas a memory for storing the command procedures and conditions.
 26. Anon-volatile memory system according to claim 8, wherein said sequencerhas a memory for storing the command procedures and conditions.
 27. Anon-volatile memory formed on a single semiconductor chip, comprising: aplurality of memory cells, each memory cell including a transistor,storing information by threshold voltage of the transistor; and asequencer having a terminal to which commands are supplied, andcontrolling a corresponding procedure to put said plurality of memorycells into an erased state or a written state in response to each of thecommands; wherein said sequencer includes a command procedure which isstarted by one of the commands to perform an operation of putting thethreshold voltage of said plurality of memory cells into a predeterminedstate; and another operation of putting a part of said plurality ofmemory cells, which are in the written state before the one of thecommands is supplied, and at least a selected one of said memory cells,which is selected from said plurality of memory cells after the one ofthe commands is supplied, into the written state.
 28. A non-volatilememory according to claim 27, further comprising: a word line to whichsaid plurality of memory cells are respectively coupled.
 29. Anon-volatile memory according to claim 28, further comprising: a dataregister coupled to said plurality of memory cells; wherein after theone of the commands is applied, said data register stores first data forsaid plurality of memory cells on the basis of a second data read fromsaid plurality of memory cells and a third data indicating the at leasta selected one of said memory cells.
 30. A non-volatile memory accordingto claim 29, wherein the erased state has a first state of thresholdvoltage, and the written state has a second state of threshold voltage;and wherein the threshold voltage of the part of said plurality ofmemory cells is temporarily between the first state and the second stateduring the command procedure.
 31. A non-volatile memory according toclaim 29, wherein the erased state is the first state of thresholdvoltage, and the written state is the second state of threshold voltage;and wherein the threshold voltage of the part of said plurality ofmemory cells is temporarily the first state during the commandprocedure.